Process and device for alternate deposition of two different materials by cathodic atomization for electronic multilayers and micromechanics uses two part target and alternate excitation

摘要

A process for alternately depositing layers of two different materials by cathodic atomization comprises using an electrically coupled two-part target whose materials are alternately excited for sputtering by magnetron discharges, one being active and the other inactive and having different plasma densities. An Independent claim is also included for a device to operate the above process.