发明名称 |
Composition for antireflection coating |
摘要 |
A resist pattern having a good form without any T-top or round top is obtained by coating on a photoresist layer an anti-reflective coating composition containing at least (a) polyacrylic acid, (b) polyvinyl pyrrolidone, (c) CnF2n+1COOOH (wherein n represents an integer of 3 to 11) and (d) tetramethylammonium hydroxide to form an anti-reflective coating, and conducting patternwise exposure and development.
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申请公布号 |
US6692892(B1) |
申请公布日期 |
2004.02.17 |
申请号 |
US20010889184 |
申请日期 |
2001.07.10 |
申请人 |
CLARIANT FINANCE (BVI) LIMITED |
发明人 |
TAKANO YUSUKE;TANAKA HATSUYUKI;LEE DONG HAN |
分类号 |
H01L21/027;G03F7/09;G03F7/11;(IPC1-7):G03F7/00;G09D5/33 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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