| 摘要 |
The object of the present invention is to provide a mark detection method, an exposure method, a device manufacturing method, a mark detection apparatus, an exposure apparatus, and a device manufactured by the use of the exposure apparatus, which are capable of reducing a position measurement error in a short time even in the case where a sampling interval must be set to about 0.2 times or more of a lower limit of a minimum periodic component. In the present invention, a mark formed on an object is irradiated with a detection beam, an image of the mark is picked up through an image-forming system, the image of the mark formed on an image pickup device is converted into an electrical image signal, a signal related to the image signal is output at predetermined sampling intervals, and a signal related to the image signal is interpolated in a cycle equal to or less than the predetermined sampling interval.
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