| 发明名称 |
Mask for beam exposure having membrane structure and stencil structure and method for manufacturing the same |
| 摘要 |
In a mask for beam exposure, a membrane structure for endless patterns and a stencil structure for terminated patterns are provided in combination. |
| 申请公布号 |
US6692877(B2) |
申请公布日期 |
2004.02.17 |
| 申请号 |
US20010982051 |
申请日期 |
2001.10.17 |
| 申请人 |
NEC ELECTRONICS CORPORATION |
发明人 |
YAMADA YASUHISA |
| 分类号 |
G03F7/12;G03F1/14;G03F1/16;G03F1/20;G03F7/20;H01J37/305;H01L21/027;(IPC1-7):G03F9/00 |
主分类号 |
G03F7/12 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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