| 摘要 |
A scanning projection exposure apparatus which has a first movable stage which moves with a first object being placed thereon, and a second movable stage which moves with a second object being placed thereof. The projection exposure apparatus scans the first and second movable stages in synchronism with each other with respect to a projection optical system, and projects a pattern formed on the first object onto the second object through the projection optical system. The apparatus includes a reference plate fixed to the first movable stage and having a mark, which is a reference for measuring deformation of the first object occurring due to exposure of the first object to exposure light, a mark, which is formed on the first object, for measuring deformation, and a detection system for detecting a position of the mark formed on the reference plate and a position of the mark formed on the first object. A deformation amount of the first object is obtained based on the position of the mark formed on the first object with respect to a reference position serving as the position of the mark formed on the reference plate, which are detected by the detection system.
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