| 摘要 |
PURPOSE: To provide a support for a lithographic printing plate with good printability in terms of a hydrophilic property, water retentivity, and adhesion to a photosensitive layer, the manufacturing method of the support, and a photosensitive lithographic printing plate. CONSTITUTION: A support for a lithographic printing plate which has a smooth surface 3μm or less in Rmax and grain structure in which the opening diameter of micropores is 8nm or more and the depth is 800nm or more. A manufacturing method for the support in which the surface of an aluminum plate, after being roughened, is subjected to chemical treatment to dissolve a sharp part of the roughened surface for smoothing so that Rz/Ra is 95% or less in comparison with that before the treatment. A photosensitive lithographic printing plate in which a photosensitive layer is formed on the support. |
