METHOD FOR REDUCING PATTERN DEFORMATION AND PHOTORESIST POISONING IN SEMICONDUCTOR DEVICE FABRICATION
摘要
申请公布号
AU2003254254(A1)
申请公布日期
2004.02.16
申请号
AU20030254254
申请日期
2003.07.29
申请人
ADVANCED MICRO DEVICES, INC.
发明人
MARK, S. CHANG;PEI-YUAN GAO;MARILYN, I. WRIGHT;LU YOU;SRIKANTESWARA DAKSHINA-MURTHY;DOUGLAS, J. BONSER;MARINA, V. PLAT;CHIH, YUH YANG;SCOTT, A. BELL;DARIN, A. CHAN;PHILIP, A. FISHER;CHRISTOPHER, F. LYONS
