发明名称 |
Dynamic targeting for a process control system |
摘要 |
<p>A method and an apparatus for dynamic targeting for a process control system. A process step is performed upon a first workpiece in a batch based upon a process target setting. The process target setting comprises at least one parameter relating to a target characteristic of the first workpiece. Manufacturing data relating to processing of the first workpiece is acquired. The manufacturing data comprises at least one of a metrology data relating to the processed first workpiece and a tool state data relating to the tool state of a processing tool. Electrical data relating to the processed first workpiece is acquired at least partially during processing of a second workpiece in the batch. The process target setting is adjusted dynamically based upon a correlation of the electrical data with the manufacturing data.</p> |
申请公布号 |
AU2003253820(A8) |
申请公布日期 |
2004.02.16 |
申请号 |
AU20030253820 |
申请日期 |
2003.07.09 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
JIN WANG;THOMAS J. SONDERMAN;ALEXANDER J. PASADYN |
分类号 |
G05B19/418;H01L21/02;H01L21/66;(IPC1-7):H01L21/66 |
主分类号 |
G05B19/418 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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