APPARATUS FOR CONTROLLING PRODUCTION OF POWDER IN EXHAUST LINE OF CHEMICAL VAPOR DEPOSITION APPARATUS

摘要

PURPOSE: An apparatus for controlling production of powder in an exhaust line of a chemical vapor deposition(CVD) apparatus is provided to prevent the powder caused by chemical reaction from being generated and avoid production of powder in the exhaust line by preventing exhaust gas exhausted from a reaction chamber in a CVD process from being accumulated in the exhaust line. CONSTITUTION: A deposition layer is formed on a wafer by a predetermined chemical reaction in a reaction chamber(1). A vacuum pump(3) performs a pumping process through a vacuum line connected to an exhaust hole of the reaction chamber. A dry scrubber(5) purifies and exhausts the exhaust gas exhausted through an exhaust line connected to the vacuum pump. A forcible transfer unit(10) transfers the exhaust gas accumulated in the exhaust line in a direction toward the dry scrubber, installed in the exhaust line between the vacuum pump and the dry scrubber.