LOAD LOCK CHAMBER PURGE SYSTEM

摘要

PURPOSE: A load lock chamber purge system is provided to minimize the generation of particles by supplying the purging gas to the load lock chamber to remove residues and fumes of the load lock chamber in a wafer loading process or a wafer unloading process. CONSTITUTION: A load lock chamber purge system includes a pumping line(160), a venting line(170), and a purging line(190). The pumping line(160) is used for maintaining a state of vacuum within a load lock chamber. The venting line(170) is used for supplying the venting gas to the load lock chamber in order to control the internal pressure of the load lock chamber. The purging line(190) is used for supplying the purging gas to the load lock chamber in order to remove residues and fumes of the load lock chamber in a wafer loading process or a wafer unloading process.