发明名称 VAPOR DEPOSITION MATERIAL, MgO VAPOR DEPOSITION MATERIAL AND ITS MANUFACTURING PROCESS, DEPOSITION PROCESS
摘要 PROBLEM TO BE SOLVED: To acceralate vapor deposition speed and to improve controllability of the vapor deposition speed when vapor deposition is applied by an electron-beam vapor deposition process. SOLUTION: A surface roughness Ra of a vapor deposition material is set to 1.0-10μm. A real surface area in consideration of an irregularity of the surface of the vapor deposition material is set 200-1,200 mm<SP>2</SP>. It is desirable to set a value of outside volume to 30-1,500 mm<SP>3</SP>. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004043956(A) 申请公布日期 2004.02.12
申请号 JP20030049694 申请日期 2003.02.26
申请人 MITSUBISHI MATERIALS CORP 发明人 SAKURAI HIDEAKI;TOYOGUCHI GINJIRO;KUROMITSU YOSHIO
分类号 C23C14/24;H01J9/20;H01J11/22;H01J11/34;H01J11/40;(IPC1-7):C23C14/24;H01J11/02 主分类号 C23C14/24
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