Layer system used in the production of micro-electromechanical structures comprises a passivating layer consisting of an inorganic partial layer and a polymeric partial layer formed on a silicon layer

摘要

Layer system comprises a passivating layer (17) consisting of a first inorganic partial layer (14) and a second polymeric partial layer (15) formed on a silicon layer (10). An Independent claim is also included for a process for the production of a passivating layer on a silicon layer.