| 摘要 |
PROBLEM TO BE SOLVED: To provide a thin-film forming apparatus for forming an organic thin film with a uniform thickness by uniformly supplying a source gas to the surface of a substrate, and to provide a thin-film forming method. SOLUTION: The thin-film forming apparatus comprises a treatment chamber 11, a substrate holder 13 installed in the treatment chamber 11, a source-gas feed pipe 21 for supplying a source gas G1 consisting of film-forming components into the treatment chamber 11, and a stirring-gas feed pipe 31 for supplying a stirring gas G2 toward the source gas supplied from the source-gas feed pipe 21, into the treatment chamber 11. The thin-film forming method is characterized by using the apparatus. COPYRIGHT: (C)2004,JPO
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