发明名称 |
THIN FILM MANUFACTURING METHOD, AND OBJECT MANUFACTURED BY USING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To prevent impartment of damage to a processed fine hole when introducing a raw material by eliminating a gas-liquid interface becoming a hindering factor when introducing the raw material into the fine hole. SOLUTION: This invention solves the problem of bubbles caused by surface tension by vanishing the gas-liquid interface by putting a raw material-dissolved solvent in a supercritical state. Since both the thin film raw material and the solvent become fluid close to gas having low viscosity by putting the solvent in the supercritical state, intrusion into a fine port is quickly caused. The gas-liquid interface is formed again, and is efficiently contacted with the inside of the fine hole by a small quantity of thin film raw materials by putting the fine hole in a state of being soaked in a raw material-dissolved liquid. Since the raw material is introduced after pressures of a thin film manufacturing tank and a raw material solution or a raw material fluid coincide when introducing the raw material, the fine hole is not broken down by a sudden pressure difference. COPYRIGHT: (C)2004,JPO
|
申请公布号 |
JP2004042153(A) |
申请公布日期 |
2004.02.12 |
申请号 |
JP20020199777 |
申请日期 |
2002.07.09 |
申请人 |
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY |
发明人 |
SHIMIZU TAKASHI;YAMADA HIROTOSHI;SUZUKI HIDEKAZU;ITO JUNJI |
分类号 |
B81C1/00;B81B1/00;(IPC1-7):B81C1/00 |
主分类号 |
B81C1/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|