| 摘要 |
A position measuring method suppresses the influence of characteristics intrinsic to masks to improve the measurement accuracy of the mark position. A mask mark RM1 is positioned within an observation field of an observation system, and one of a plurality of fiducial marks FMa, FMb is selectively positioned within the observation field based on the characteristic of the mask mark RM1 with respect to an illumination beam, and the relative positional information of the mask mark RM1 and a fiducial mark WFM1 is obtained based on the observation results.
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