发明名称 |
Ag base alloy thin film and sputtering target for forming Ag base alloy thin film |
摘要 |
The present invention relates to an Ag alloy film. Particularly, it is preferably used as a reflective film or semi-transmissive reflective film for an optical information recording medium having high thermal conductivity/high reflectance/high durability in the field of optical information recording media, an electromagnetic-shielding film excellent in Ag aggregation resistance, and an optical reflective film on the back of a reflection type liquid crystal display device, or the like. The Ag alloy film of the present invention comprises an Ag base alloy containing Bi and/or Sb in a total amount of 0.005 to 10% (in terms of at %). Further, the present invention relates to a sputtering target used for the deposition of such an Ag alloy film.
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申请公布号 |
US2004028912(A1) |
申请公布日期 |
2004.02.12 |
申请号 |
US20030633550 |
申请日期 |
2003.08.05 |
申请人 |
KABUSHIKI KAISHA KOBE SEIKO SHO (KOBE STEEL, LTD.) |
发明人 |
TAUCHI YUUKI;TAKAGI KATSUTOSHI;NAKAI JUNICHI;SATO TOSHIKI |
分类号 |
B32B15/04;C22C5/06;C22C5/08;C23C14/14;C23C14/18;C23C14/34;G11B7/24;G11B7/253;G11B7/2531;G11B7/257;G11B7/258;G11B7/259;G11B7/26;(IPC1-7):B32B15/04 |
主分类号 |
B32B15/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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