发明名称 Reflective mirror for lithographic exposure and production method
摘要 The present invention, generally speaking, provides an efficient method of sending a long message from a first compute node to a second compute node across an interconnection network. In the first compute node, a message header field is set to a predetermined value and the message is sent. In the second compute node, the message header is received and processed, and a memory location is read in accordance with the contents of a base address register and an index register. Using Direct Memory Access, the message is then stored in memory at a storage address determined in accordance with the contents of the memory location. Preferably, the storage address is aligned on a memory page boundary.
申请公布号 US2004030814(A1) 申请公布日期 2004.02.12
申请号 US20030632752 申请日期 2003.08.01
申请人 KAMM FRANK-MICHAEL;RAU JENSPETER 发明人 KAMM FRANK-MICHAEL;RAU JENSPETER
分类号 G02B1/02;G02B1/10;G02B1/12;G02B5/08;G03F1/14;G03F1/24;G03F7/00;G03F7/20;G06F13/28;(IPC1-7):G06F13/28 主分类号 G02B1/02
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