INSPECTION METHOD AND PHOTOMASK

摘要

PROBLEM TO BE SOLVED: To provide a high-accuracy inspection method of a projection optical system by which the influence of double refraction can be separated from the other causes of deterioration of images.

SOLUTION: Optical characteristics of a projection optical system 9 is searched by transferring an exposure mark of a photomask 33 to a resist applied on a wafer 10 using a polarized first exposure light. Then the optical characteristics of the projection optical system 9 is searched by transferring the exposure mark of the photomask 33 to the resist applied on the wafer 10 using a second exposure light which is different from the first exposure light in the polarization state. The performance inspection of the projection optical system 9 is executed by calculating the difference in the optical characteristics searched using the first and second exposure lights.

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