VACUUM PROCESSOR AND SUBSTRATE HOLDING-DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a rotation/revolution substrate holding device with cooling mechanism, which has a substrate presser with cooling structure and compatible with a single wafer type device that can rotate and revolve. SOLUTION: In the substrate holding device, a space 17 of atmospheric pressure is formed inside a substrate holding device rotary unit 6 which can rotate and revolve. A joint hose 112 of water is stored in the space of atmospheric pressure and cooling water is made to flow to a substrate pressing ring 8. COPYRIGHT: (C)2004,JPO