发明名称 |
Method of making extreme ultraviolet lithography glass substrates |
摘要 |
A method for making extreme ultraviolet lithography tool glass substrates includes generating a plasma, delivering reactants comprising a silica precursor and a titania precursor into the plasma to produce titania and silica particles, and depositing the titania and silica particles on a deposition surface to form a homogeneous titania-doped silica. The invention provides for homogeneous glass substrates that are free of striae variations and provides for beneficial extreme ultraviolet lithography reflective optics.
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申请公布号 |
US2004025542(A1) |
申请公布日期 |
2004.02.12 |
申请号 |
US20030456318 |
申请日期 |
2003.06.05 |
申请人 |
BALL LAURA J.;RAKOTOARISON SYLVAIN |
发明人 |
BALL LAURA J.;RAKOTOARISON SYLVAIN |
分类号 |
C03B19/01;C03B19/14;(IPC1-7):C03B19/06;C03B37/018 |
主分类号 |
C03B19/01 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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