Microlithography installation investigation device for determination of the effect of a microlithography UV light projecting installation on the polarization direction of UV radiation incident on it

摘要

Method for determining the change in polarization of light incident on an examined optical system, whereby light of known polarization is incident and the polarization of the output light is measured. The difference in polarization indicates the effect of the optical system. The inventive method is used with an optical system of predefined aperture and whereby the determination of the effect of the system on polarization is made by varying the aperture in a pupil-like manner. An Independent claim is made for a device for determining the change in polarization of light incident on an examined optical system.