| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing pad superior in flatness, in-plane uniformity and a polishing speed, and having less variable polishing speed. <P>SOLUTION: This polishing pad has a polishing layer of a resin layer. The resin layer is composed of a polyurethane resin foaming body having fine foam of an average foam diameter not more than 70 μm. The polyurethane resin foaming body includes polyether polyol, polyester polycarbonate polyol or polycarbonate polyol by 50 wt.% or more to the whole polyol compound as alkali resistant polyol. The polishing layer is set to 10 mg or less on a difference in an abrasion loss quantity by a taper abrasion test before and after a 24-hour soaking test to a potassium hydroxide aqueous solution (40 °C) of pH 12.5. <P>COPYRIGHT: (C)2004,JPO |
