| 摘要 |
PROBLEM TO BE SOLVED: To provide a thin-film forming apparatus for forming an organic thin film with a uniform thickness on the surface of a substrate, and to provide a thin-film forming method. SOLUTION: The thin-film forming apparatus has a treatment chamber 11, a substrate holder 13 installed in the treatment chamber 11, a gas supply means 15 for supplying a gas G to a substrate-mounting surface 13a of the substrate holder 13, and an outlet 31 for exhausting a redundant gas G in the treatment chamber 11, wherein the outlet 31 is installed into plurality, and each outlet 31 is arranged so that the gas G supplied from the gas supply means 15 is introduced to each part of the substrate-mounting surface 13a. The thin-film forming method is characterized by using the apparatus. COPYRIGHT: (C)2004,JPO
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