发明名称 MgO VAPOR DEPOSITION MATERIAL AND ITS MANUFACTURING PROCESS, MANUFACTURING PROCESS OF MgO DEPOSITION FILM
摘要 PROBLEM TO BE SOLVED: To provide a process by which, if deposited by electron-beam deposition process, optimization of relation between splash intensity and deposition (evaporation) rate is achieved while achieving reduction of material cost and productivity improvement. SOLUTION: An MgO purity of MgO vapor deposition material is 99.0% or more and relative density 90.0% or more, and outside volume is 35 mm-1,500 mm. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004043955(A) 申请公布日期 2004.02.12
申请号 JP20030049693 申请日期 2003.02.26
申请人 MITSUBISHI MATERIALS CORP 发明人 SAKURAI HIDEAKI;TOYOGUCHI GINJIRO;KUROMITSU YOSHIO
分类号 C23C14/24;H01J9/02;H01J11/22;H01J11/34;H01J11/40;(IPC1-7):C23C14/24;H01J11/02 主分类号 C23C14/24
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