发明名称 |
MgO VAPOR DEPOSITION MATERIAL AND ITS MANUFACTURING PROCESS, MANUFACTURING PROCESS OF MgO DEPOSITION FILM |
摘要 |
PROBLEM TO BE SOLVED: To provide a process by which, if deposited by electron-beam deposition process, optimization of relation between splash intensity and deposition (evaporation) rate is achieved while achieving reduction of material cost and productivity improvement. SOLUTION: An MgO purity of MgO vapor deposition material is 99.0% or more and relative density 90.0% or more, and outside volume is 35 mm-1,500 mm. COPYRIGHT: (C)2004,JPO
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申请公布号 |
JP2004043955(A) |
申请公布日期 |
2004.02.12 |
申请号 |
JP20030049693 |
申请日期 |
2003.02.26 |
申请人 |
MITSUBISHI MATERIALS CORP |
发明人 |
SAKURAI HIDEAKI;TOYOGUCHI GINJIRO;KUROMITSU YOSHIO |
分类号 |
C23C14/24;H01J9/02;H01J11/22;H01J11/34;H01J11/40;(IPC1-7):C23C14/24;H01J11/02 |
主分类号 |
C23C14/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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