发明名称 |
Process solutions containing acetylenic diol surfactants |
摘要 |
Process solutions comprising one or more acetylenic diol type surfactants are used to reduce the number of defects in the manufacture of semiconductor devices. In certain preferred embodiments, the process solution of the present invention may reduce post-development defects by improving the wetting of the solution on the surface of the patterned photoresist layer while minimizing foaming and bubble generation.
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申请公布号 |
US2004029395(A1) |
申请公布日期 |
2004.02.12 |
申请号 |
US20020218087 |
申请日期 |
2002.08.12 |
申请人 |
ZHANG PENG;KING DANIELLE MEGAN;KARWACKI EUGENE JOSEPH;BARBER LESLIE COX |
发明人 |
ZHANG PENG;KING DANIELLE MEGAN;KARWACKI EUGENE JOSEPH;BARBER LESLIE COX |
分类号 |
G03F7/004;G03F7/09;G03F7/16;G03F7/30;G03F7/32;G03F7/38;G03F7/40;G03F7/42;(IPC1-7):H01L21/302;C07C43/11;C07C43/18;C07C43/20 |
主分类号 |
G03F7/004 |
代理机构 |
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地址 |
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