发明名称 SURFACE-EMMITTING SEMICONDUCTOR LASER, AND METHOD AND APPARATUS FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a surface emitting semiconductor laser, capable of accurately controlling the reaction of oxidation reaction of III-V semiconductor layer containing aluminum. SOLUTION: The manufacturing method comprises the steps of forming a first and second mesas (210, 310) with a side of the III-V semiconductor layer containing aluminum exposing on a substrate, exposing the first and second mesas in an oxidizing atmosphere at a predetermined temperature or lower, optically monitoring the oxidation state of the III-V semiconductor layer containing aluminum of the first mesa, and controlling the oxidized region of the III-V semiconductor layer containing alminum of the second mesa, on the basis of the result of monitoring to form a current constricting part (10). COPYRIGHT: (C)2004,JPO
申请公布号 JP2004047636(A) 申请公布日期 2004.02.12
申请号 JP20020201594 申请日期 2002.07.10
申请人 FUJI XEROX CO LTD 发明人 NAKAYAMA HIDEO;SAKAMOTO AKIRA
分类号 H01L21/66;H01L21/00;H01L21/3065;H01L21/31;H01S3/08;H01S5/00;H01S5/026;H01S5/183;H01S5/343;(IPC1-7):H01L21/66;H01L21/306 主分类号 H01L21/66
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