发明名称 |
SPECTROSCOPIC DETECTOR FOR PLASMA TREATMENT APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a spectroscopic detector of a plasma treatment apparatus capable of conducting precise treatment to samples. SOLUTION: A plasma 7 is generated in a treatment chamber, and generated plasma is used to apply treatment to a sample housed in the treatment chamber. A diffraction grating 23 introduces plasma emission for spectrometry so that a spectrum comprising a plurality of band-like beams of prescribed widths is generated. A light detection sensor 24 comprises a plurality of sensor elements for measuring the emission intensity of the band-like beams in the width direction and the wavelength direction. The light-detecting sensor 24 is provided with a plurality of sensor elements arranged in a plurality of lines parallel to each other, and the array of a plurality of sensor elements of the plurality of lines diagonally crosses the width direction of the band-like beam. COPYRIGHT: (C)2004,JPO
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申请公布号 |
JP2004047628(A) |
申请公布日期 |
2004.02.12 |
申请号 |
JP20020201478 |
申请日期 |
2002.07.10 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
IKUHARA SHIYOUJI;TANAKA JUNICHI;YAMAMOTO HIDEYUKI |
分类号 |
H01L21/3065;(IPC1-7):H01L21/306 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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