发明名称 Method for selectively metalizing dieletric materials
摘要 Method for selectively metallizing dielectric materials, the method includes: adhesively covering dielectric materials with an activating layer comprising a conductive material, which layer is subsequently structured by way of laser ablation; and using a subsequent laser treatment to structure the activating layer in such a way that discrete conductive structures are formed, which are subsequently metallized.
申请公布号 US2004026254(A1) 申请公布日期 2004.02.12
申请号 US20030381508 申请日期 2003.08.04
申请人 HUPE JURGEN;KRONENBERG WALTER;KICKELHAIN JORG;MEIER DIETER J. 发明人 HUPE JURGEN;KRONENBERG WALTER;KICKELHAIN JORG;MEIER DIETER J.
分类号 C23C18/16;C25D5/02;C25D5/54;C25D5/56;C25D7/00;H05K3/10;H05K3/18;H05K3/24;(IPC1-7):C25D5/00 主分类号 C23C18/16
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