发明名称 |
Resist stripping liquid containing fluorine compound |
摘要 |
In the present invention, the concentration of dissolved oxygen in the resist stripping liquid is limited to 3 ppm or lower. Using the resist stripping liquid having such a low dissolved oxygen concentration, resist residues are removed from a substrate containing copper and/or a copper alloy without causing the corrosion of copper.
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申请公布号 |
US2004029753(A1) |
申请公布日期 |
2004.02.12 |
申请号 |
US20030601659 |
申请日期 |
2003.06.24 |
申请人 |
IKEMOTO KAZUTO;OHTO MASARU |
发明人 |
IKEMOTO KAZUTO;OHTO MASARU |
分类号 |
G02F1/13;C09D9/00;C11D7/08;C11D7/10;C11D7/26;C11D7/32;C11D7/34;C11D7/50;C11D11/00;G03F7/42;H01L21/027;H01L21/304;(IPC1-7):C23G1/00 |
主分类号 |
G02F1/13 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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