| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist material, particularly a chemical amplification positive type resist material having higher sensitivity, resolution, exposure margin and process adaptability than a conventional resist material, ensuring a good pattern shape after exposure and exhibiting excellent heat stability. <P>SOLUTION: The resist material contains a high molecular compound containing repeating units shown by formula (1) and having a weight average molecular weight of 1,000 to 500,000 (wherein R<SP>1</SP>and R<SP>2</SP>are H, a hydroxy group, an alkyl group, a halogen atom, or a trifluoromethyl group, R<SP>3</SP>is a methyl group or an ethyl group; R<SP>4</SP>and R<SP>5</SP>are an alkyl group, and R<SP>4</SP>and R<SP>5</SP>may combine with each other to form a cyclic structure). <P>COPYRIGHT: (C)2004,JPO |
