发明名称 OXIDE TRANSPARENT CONDUCTIVE FILM AND ITS MANUFACTURING METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an oxide transparent conductive film excellent in permeability not only in the visual radiation range, but also in infrared radiation range and having low resistant value. <P>SOLUTION: Indium oxide is contained as the essential component, and the indium in the indium oxide is substituted into tungsten with the ratio of 0.019-0.034 tungsten/indium in the rate of atom numbers, and the indium oxide is single crystal. In the other way, film-formation is formed by spattering, and crystallized indium oxide is contained as essential component and in the oxide transparent conductive film containing the tungsten, substantially the whole tungsten is substituted to the indium in the indium oxide. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2004043851(A) 申请公布日期 2004.02.12
申请号 JP20020200534 申请日期 2002.07.09
申请人 SUMITOMO METAL MINING CO LTD 发明人 ABE TAKAYUKI
分类号 G02B1/10;C01G15/00;C03C17/245;C23C14/08;C23C14/34;H01L31/04;(IPC1-7):C23C14/08 主分类号 G02B1/10
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