Oxidizing a layer comprises inserting the substrate carrying a layer stack into a heating unit, feeding an oxidation gas onto the substrate, heating to a process temperature, and regulating or controlling the temperature

摘要

Oxidizing a layer comprises preparing a substrate (114) supporting a layer to be oxidized which is part of a layer stack containing the substrate or base layer and a neighboring layer formed on the surface of the layer to be oxidized facing the base surface, inserting the substrate carrying the layer stack into a heating unit (80), feeding an oxidation gas onto the substrate, heating the substrate to a process temperature, acquiring the process temperature during processing via the substrate of a receiving unit (110) for the substrate, and regulating or controlling the substrate temperature at a prescribed theoretical temperature during processing. An Independent claim is also included for a receiving unit having a recess (124) for an exchangeable ring (128) for the substrate.