发明名称 SEMICONDUCTOR ELEMENT AND ITS MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a semiconductor element which is equipped with a element constituting layer having good crystallinity and is excellent in property. <P>SOLUTION: The semiconductor element is provided with an element constituting layer 20 composed of a nitride semiconductor on the substrate 1. A first buffer layer 2A formed at a low temperature lower than a single crystal growth temperature and a second buffer layer 2B containing no Ga nor In adjacent to the first buffer layer 2A are formed on the substrate 1 in the order, and the element constituting layer 20 is formed on the second buffer layer 2B. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004048076(A) 申请公布日期 2004.02.12
申请号 JP20030371328 申请日期 2003.10.30
申请人 SANYO ELECTRIC CO LTD;TOTTORI SANYO ELECTRIC CO LTD 发明人 HATA MASAYUKI;KUNISATO TATSUYA;TOMINAGA KOJI;MATSUSHITA YASUHIKO
分类号 H01L21/205;H01L33/06;H01L33/12;H01L33/32 主分类号 H01L21/205
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