发明名称 |
SEMICONDUCTOR ELEMENT AND ITS MANUFACTURING METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a semiconductor element which is equipped with a element constituting layer having good crystallinity and is excellent in property. <P>SOLUTION: The semiconductor element is provided with an element constituting layer 20 composed of a nitride semiconductor on the substrate 1. A first buffer layer 2A formed at a low temperature lower than a single crystal growth temperature and a second buffer layer 2B containing no Ga nor In adjacent to the first buffer layer 2A are formed on the substrate 1 in the order, and the element constituting layer 20 is formed on the second buffer layer 2B. <P>COPYRIGHT: (C)2004,JPO |
申请公布号 |
JP2004048076(A) |
申请公布日期 |
2004.02.12 |
申请号 |
JP20030371328 |
申请日期 |
2003.10.30 |
申请人 |
SANYO ELECTRIC CO LTD;TOTTORI SANYO ELECTRIC CO LTD |
发明人 |
HATA MASAYUKI;KUNISATO TATSUYA;TOMINAGA KOJI;MATSUSHITA YASUHIKO |
分类号 |
H01L21/205;H01L33/06;H01L33/12;H01L33/32 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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