发明名称 VACUUM PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a vacuum processing device, capable of surely and satisfactorily maintaining the connection state of a processing gas path connection mechanism and of reducing the labor required for maintaining the mechanism in comparison to conventional devices. SOLUTION: An inlet-side block 30 of the processing gas path connection mechanism 19 is locked in an insertion state in a cylindrical guide 42, having a bottom and a coil spring 43 for biasing the inlet-side block 30 to the exit-side block 50, is provided between the bottom of the guide 42 and the lower surface of the inlet-side block 30. O-rings 33, 34, and 35 for hermetic sealing are arranged in the insertion state in grooves 36, 37, and 38 on an upper surface 32 of the inlet-side block 30. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004047652(A) 申请公布日期 2004.02.12
申请号 JP20020201999 申请日期 2002.07.10
申请人 TOKYO ELECTRON LTD 发明人 AOTO MASA;SENZAKI SHIGERU
分类号 H01L21/3065;(IPC1-7):H01L21/306 主分类号 H01L21/3065
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