发明名称 |
Post-CMP cleaning of semiconductor wafer surfaces using a combination of aqueous and CO2 based cryogenic cleaning techniques |
摘要 |
The present invention provides for a new and improved method of aqueous and cryogenic enhanced (ACE) cleaning for semiconductor surfaces as well as the surfaces of metals, dielectric films particularly hydrophobic low k dielectric films, and CMP etch stop films to remove post-CMP contaminants. It is particularly useful for removing contaminants which are 0.3 mum in size or smaller. The ACE cleaning process is applied to a surface which has undergone chemical-mechanical polishing (CMP). It includes the steps of cleaning the surface with an aqueous-based cleaning process, at least partially drying the surface, and, shortly thereafter, cleaning the surface with a CO2 cryogenic cleaning process. This process removes such contaminants from surfaces which are hydrophobic and hence difficult to clean with aqueous-based cleaning techniques alone.
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申请公布号 |
US2004029494(A1) |
申请公布日期 |
2004.02.12 |
申请号 |
US20020215859 |
申请日期 |
2002.08.09 |
申请人 |
BANERJEE SOUVIK;CHUNG HARLAN FORREST |
发明人 |
BANERJEE SOUVIK;CHUNG HARLAN FORREST |
分类号 |
B08B7/04;B08B3/02;B08B3/08;B08B7/00;H01L21/02;H01L21/304;H01L21/306;H01L21/3105;H01L21/321;(IPC1-7):B24B1/00 |
主分类号 |
B08B7/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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