发明名称 Microwave plasma processing apparatus, microwave processing method and microwave feeding apparatus
摘要 A microwave plasma processing apparatus includes a processing vessel, a microwave generator, a waveguide guiding a microwave formed by the microwave generator, and a microwave emitting member emitting the microwave with wavelength compression by a retardation plate, wherein the waveguide has a single microwave output opening in a location corresponding to a central par of the microwave emitting member.
申请公布号 US2004026039(A1) 申请公布日期 2004.02.12
申请号 US20030450149 申请日期 2003.06.11
申请人 GOTO NAOHISA;OHMI TADAHIRO;HIRAYAMA MASAKI;GOTO TETSUYA 发明人 GOTO NAOHISA;OHMI TADAHIRO;HIRAYAMA MASAKI;GOTO TETSUYA
分类号 H05H1/46;B01J19/08;C23C16/511;H01J37/32;H01L21/205;H01L21/302;H01L21/3065;(IPC1-7):C23F1/00;C03C15/00;B44C1/22;C23C16/00 主分类号 H05H1/46
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