| 发明名称 |
Polymers, resist compositions and patterning process |
| 摘要 |
A resist composition comprising a polymer containing vinyl sulfonate units having fluorinated hydrophilic groups as a base resin has excellent transparency, substrate adhesion and developer penetrability as well as plasma etching resistance, and is suited for lithographic microprocessing.
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| 申请公布号 |
US2004030079(A1) |
申请公布日期 |
2004.02.12 |
| 申请号 |
US20030636692 |
申请日期 |
2003.08.08 |
| 申请人 |
HARADA YUJI;HATAKEYAMA JUN;KAWAI YOSHIO;SASAGO MASARU;ENDO MASAYUKI;KISHIMURA SHINJI;MAEDA KAZUHIKO;OOTANI MICHITAKA;KOMORIYA HARUHIKO |
发明人 |
HARADA YUJI;HATAKEYAMA JUN;KAWAI YOSHIO;SASAGO MASARU;ENDO MASAYUKI;KISHIMURA SHINJI;MAEDA KAZUHIKO;OOTANI MICHITAKA;KOMORIYA HARUHIKO |
| 分类号 |
C08F28/02;C08F212/14;C08F220/12;C08F232/00;G03F7/004;G03F7/039;H01L21/027;(IPC1-7):C08F12/30 |
主分类号 |
C08F28/02 |
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