| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a transfer mask for exposure for coping with a case that patterns need to be changed, and partial cells have some inconveniences, or the like, in a character projection method, and to provide a pattern exchange method in the transfer mask for exposure. <P>SOLUTION: The transfer mask 10 for exposure has a mask section 11 having a plurality of cells 12 where an opening in a specific pattern shape is formed, transmits charged particle beams according to a pattern when the cell 12 is irradiated with charged particle beams, transfers the pattern of the cell 12 on a substrate, and forms an exposure pattern on the substrate. In the transfer mask 10 for exposure, the mask section 11 comprises one or a plurality of blocks 14 having one or a plurality of cells; a support section 18 for supporting the blocks 14; and an adhesive member 16 that adheres and removes the block 14 to and from the support 18. The blocks 14 can be removed by removing the adhesive member 16 for changing it to a new block. <P>COPYRIGHT: (C)2004,JPO |
