| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of preparing a resist composition which has no variability of properties among lots in addition to storage stability of the resist composition after preparation. <P>SOLUTION: A novolac resin solution obtained by blending benzoquinone to a novolac resin solution obtained by dissolving a novolac resin in an organic solvent is disclosed. Besides, a positive type photoresist composition comprising the novolac resin solution and a photosensitive component, a positive type photoresist composition comprising the novolac resin solution, a photosensitive component and hydroquinone, and a method of preparing a positive type photoresist composition wherein a novolac resin solution and a photosensitive component are mixed are also provided. <P>COPYRIGHT: (C)2004,JPO |
