发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To improve on in-plane uniformity of substrates in a processing unit irrespective of where they are supported in a boat. SOLUTION: In the substrate processing unit 10, a plurality of substrates W are placed in a reactor 11, as supported in a boat 17. A substrate supporting region A in the boat 17 is divided into a plurality of regions, which are, for instance, an upper substrate supporting region TC and a lower substrate supporting region B. Gaps between the substrates in a region are different from those in the other region. Not all the substrate supporting regions or positions are taught to a substrate transfer device 20. In cases where the transfer device 20 carries but one substrate W, the topmost positions TC1, B1 and the bottom positions TC2, B2 in the regions TC, B are taught. In cases where the transfer device 20 carries a plurality of substrates W, for instance, five substrates, the same is taught about the bottom positions in the regions TC, B. As for the topmost positions, however, the fourth positions counted downward from the topmost positions TC1, B1 are taught as the topmost positions. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004047767(A) 申请公布日期 2004.02.12
申请号 JP20020203711 申请日期 2002.07.12
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 HARADA TORU
分类号 C23C16/458;H01L21/31;H01L21/68;H01L21/683;(IPC1-7):H01L21/31 主分类号 C23C16/458
代理机构 代理人
主权项
地址