| 发明名称 |
Methods using a peroxide-generating compound to remove group VIII metal-containing residue |
| 摘要 |
A method for cleaning substrates to remove Group VIII metal-containing, particularly platinum-containing, residue using a cleaning composition that includes a peroxide-generating compound.
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| 申请公布号 |
US2004029392(A1) |
申请公布日期 |
2004.02.12 |
| 申请号 |
US20020215402 |
申请日期 |
2002.08.08 |
| 申请人 |
MICRON TECHNOLOGY, INC. |
发明人 |
MORGAN PAUL A. |
| 分类号 |
B08B6/00;C11D3/39;C11D11/00;H01L21/02;H01L21/302;H01L21/306;H01L21/321;H01L21/3213;H01L21/461;(IPC1-7):H01L21/302 |
主分类号 |
B08B6/00 |
| 代理机构 |
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