| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma processing apparatus for performing high precision feedback control of plasma by improving optical transmissive efficiency monitoring plasma emission, and to provide its method. <P>SOLUTION: The plasma processing apparatus has a light-transmitting window for monitoring the plasma emission on the side wall of a processing chamber, and a means for introducing a light lighted from the light-transmitting window to a photodetector. In the plasma processing apparatus for performing feedback control of plasma processing by utilizing intensity change of the plasma emission, the light-transmitting window is set as a projection shape of the shape of a part projected the outside, from the sidewall of the processing chamber. <P>COPYRIGHT: (C)2004,JPO |
