发明名称 SURFACE TREATMENT METHOD OF ORGANIC THIN FILM
摘要 PROBLEM TO BE SOLVED: To provide a surface treatment method of an organic film which is needed for forming a multi-layer of the thin films in the case the thin film is composed of a solvent-soluble organic material used as an insulating layer, concerning a process of manufacturing the multi-layer wiring used for a digital integrated circuit chip for high speed information processing and a mounting system such as a package, a module and a board for mounting the chip. SOLUTION: When a second layer is formed on a first layer to form the multi-layer of the thin film, in the case the thin film is formed by using a thin film forming method such as spin coating with the solvent-soluble organic material used as the insulating layer, the film thickness is considerably reduced from an assumed value when the thin film is formed because the first layer dissolves in the solvent in applying the second layer, and a film thickness distribution is extremely deteriorated. To overcome these problems, this surface treatment method modifies the surface of the first layer by irradiating the surface with a single or a plurality of particle rays or light such as plasma ions, electronic beams or Deep-UV to make the first layer insoluble in the solvent when the second layer is applied on the first layer so as to form the second layer. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004047744(A) 申请公布日期 2004.02.12
申请号 JP20020203373 申请日期 2002.07.12
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY;PI R & D CO LTD 发明人 AOYANAGI MASAHIRO;NAKAGAWA HIROSHI;TOKORO KAZUHIKO;KIKUCHI KATSUYA;TEI INJITSU;ITAYA HIROSHI;SEGAWA SHIGEMASA
分类号 H01L21/768;H01L21/312;H01L23/12;H01L23/522;(IPC1-7):H01L21/312 主分类号 H01L21/768
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