发明名称 ELECTRON BEAM LITHOGRAPHY SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a low-cost and robust mechanical system which highly precisely positions beam for a rotational electron beam mastering device. SOLUTION: A rotating table 31 holding a sample 6 is driven to rotate by a rotation motor 28 and is linearly driven by a translatory motor 43. A ball bearing 27 is used as a bearing for a rotating shaft 40, a fluctuation of rotation in a radius direction is measured by volume displacement gages 44a, 44b, and a deviation from a targeted value in a translatory movement is detected by a laser measuring apparatus 47. By inputting a volume of the measurement error into an error detection/correction circuit 48, adding two kinds of error volumes to make up a deflection signal 25, and inputting it into an electrostatic deflection electrode 15, the electron beam 10 is positioned in precision. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004047170(A) 申请公布日期 2004.02.12
申请号 JP20020200113 申请日期 2002.07.09
申请人 HITACHI LTD 发明人 HOSAKA SUMIO;SUZUKI TATSUTO;NISHIDA TETSUYA
分类号 G03F7/20;G11B7/26;H01J37/20;H01J37/305;H01L21/027;(IPC1-7):H01J37/20 主分类号 G03F7/20
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