Pattern inspection method and apparatus using electron beam

摘要

A pattern inspecting method and apparatus in which changed particles irradiate an object substrate having patterns formed thereon, sequential detection on a time division basis utilizing a plurality of sensors at, at least one of a secondary electron, reflected electron and transparent electron generated from the object substrate which is irradiated is effected and digital images at a rate higher than a rate obtained with a plurality of the sensors or with a discrete sensor forming divided sensors by a time-series processing of the signal obtained through the detection on a time division basis is obtained. A defect of the patterns formed on the object substrate is detected in accordance with the obtained digital images.