发明名称 |
Illumination system particularly for microlithography |
摘要 |
There is provided an illumination system, particularly for microlithography with wavelengths<=193 nm. The illumination system includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component transforms the primary light source into a plurality of secondary light sources that are imaged by the second optical component in the exit pupil. The first optical component includes a first optical element having a plurality of first raster elements that are imaged into the image plane producing a plurality of images being superimposed at least partially on a field in the image plane. The plurality of first raster elements have negative optical power.
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申请公布号 |
US2004028175(A1) |
申请公布日期 |
2004.02.12 |
申请号 |
US20030381945 |
申请日期 |
2003.08.07 |
申请人 |
ANTONI MARTIN;SINGER WOLFGANG;WANGLER JOHANNES |
发明人 |
ANTONI MARTIN;SINGER WOLFGANG;WANGLER JOHANNES |
分类号 |
G02B13/18;G02B17/00;G02B17/08;G02B19/00;G03F7/20;G21K1/06;G21K5/00;G21K5/02;G21K5/04;H01L21/027;(IPC1-7):G21K5/00 |
主分类号 |
G02B13/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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