WINDOWLESS BELT AND METHOD FOR IN-SITU WAFER MONITORING
摘要
<p>A belt for polishing a workpiece such as a semiconductor wafer in a chemical mechanical polishing system includes an endless belt. The belt has an aperture. The aperture is unobstructed, such as using no window.</p>
申请公布号
EP1214174(B1)
申请公布日期
2004.02.11
申请号
EP20000954098
申请日期
2000.08.16
申请人
LAM RESEARCH CORPORATION;SCAPA GROUP PLC
发明人
XU, CANGSHAN;LOMBARDO, BRIAN, S.;BAJAJ, RAJEEV;SURANA, RAHUL, K.
