| 摘要 |
A method for manufacturing an embossed surface including a polymer composition having reactive moieties and a first glass transition temperature T<SUB>g1</SUB>. The method includes embossing the surface a temperature T<SUB>emb</SUB>; and raising the first glass transition temperature T<SUB>g1 </SUB>of the embossed polymeric surface to a second glass transition temperature T<SUB>g2 </SUB>such that T<SUB>g2</SUB>>T<SUB>emb</SUB>. In another embodiment, a method for improving the release of a polymeric surface from an embossing tool includes incorporating one or more of fluorine atoms, silicon atoms, or siloxane segments into the backbone of polymer. The methods are particular suited for direct patterning of photoresists, fabrication of interdigitated electrodes, and fabrication of data storage media.
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