| 摘要 |
A photoresist composition having: (A) a polymer selected from the group consisting of: (a) a fluorine-containing copolymer having a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic; (b) a branched polymer containing protected acid groups, said polymer comprising one or more branch segment(s) chemically linked along a linear backbone segment; (c) fluoropolymers having at least one fluoroalcohol group having the structure: -C(R<SUB>f</SUB>)(R<SUB>f</SUB>')OH, wherein R<SUB>f </SUB>and R<SUB>f</SUB>' are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF<SUB>2</SUB>)<SUB>n </SUB>wherein n is 2 to 10; (d) amorphous vinyl homopolymers of perfluoro(2,2-dimethyl-1,3-dioxole) or CX<SUB>2</SUB>-CY<SUB>2 </SUB>where X-F or CF<SUB>3 </SUB>and Y--H or amorphous vinyl copolymers of perfluoro(2,2-dimethyl-1,3-dioxole) and CX<SUB>2</SUB>-CY<SUB>2</SUB>; and (e) nitrile/fluoroalcohol-containing polymers prepared from substituted or unsubstituted vinyl ethers; (B) at least one photoactive component; and (C) a functional compound selected from the group consisting of a base and a surfactant. The polymer may have an absorption coefficient of less than about 5.0<SUP>m?-1 </SUP>at a wavelength of about 157 nm. These photoresist compositions have improved imaging properties.
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