| 摘要 |
PURPOSE: A method of fabricating a fringe field switching mode liquid crystal display is provided to reduce the number of mask processes of a liquid crystal display fabrication procedure. CONSTITUTION: The first transparent metal layer is formed on a transparent insulating substrate(51) and patterned, to form a counter electrode(53). The first metal layer is formed on the substrate including the counter electrode. The first metal layer is patterned to form a gate bus line(55) including a gate electrode and a common bus line(57). An insulating layer(58) and a semiconductor layer are formed on the substrate. The semiconductor layer is patterned to form a channel layer(59) on the insulating layer formed on the gate electrode. The second metal layer is formed on the channel layer and insulating layer and patterned to form source and drain electrodes(61a,61). A passivation layer(65) and a photoresist film are sequentially formed o the substrate. The photoresist film is exposed to form a photoresist pattern having a via pattern corresponding to the source electrode and half tone regions corresponding to pixel regions. The passivation layer is etched using the photoresist pattern. The half tone regions are removed through ashing. The second transparent metal layer is formed on an exposed portion of the passivation layer, the remaining photoresist pattern and an exposed portion of the source electrode. Pixel electrodes(69) are formed on a portion of the passivation layer, which is exposed by selectively removing the portion of the second transparent metal layer, placed on the remaining photoresist pattern and the remaining photoresist pattern. |
